The heat-rersistand protective windows of Midwest optical are for optimal thermal resistance and safety in high-temperature applications. Designed to withstand extreme heat, the windows offer excellent protection while maintaining their integrity even in demanding environments. They are also chemical resistant and offer high transmission in the UV through NIR.
The industrial spectrophotometer IPM from ColorLite comes with completely newly developed software.
EVK’s Alpha G100 CS real-time image processing system combines the classification of multimodal data, such as hyperspectral, RGB and conductivity data, with advanced functions for sorting applications.
Light output up to 30 times brighter than in permanent operation and three flash configurations in one compact controller: the Basic series from Lumimax is now available in flash mode.
The modular dart M board level camera with GigE interface from Basler can be individually configured.
Ximea expands the offer of UV cameras with their MX081 models.
At the Control Messe, Micro Epsilon is presenting a first demo of the 3D Profile Unit, which allows profile stitching of up to eight laser scanners that are integrated via GigE Vision as a raw data supplier.
Twincat Machine Learning Creator from Beckhoff complements the workflow in Twincat 3 with the automated creation of AI models.
The high-speed camera pco.dimax 3.6 ST Streaming captures with an AI software clear images at a recording speed of over 2,000 fps at a resolution of 3.6MP, making it ideal for use in high-speed sorting, analysis, and inspection applications.
Teledyne Flir’s Forge 1GigE IP67 camera is designed for smart agriculture, food and beverage industries.
LMI Technologies new Gocator 4000 series introduces coaxial line confocal sensor technology to complement LMI’s existing Line Confocal product portfolio.
The Macro Station from Optometron is a video workstation that offers powerful all-in-one complete equipment with a zoom lens, tripod, lighting, camera and monitor.
Efinix´s Ti375 FPGA is manufactured in an advanced 16 nm process node.
